• S.Jayalakshmi Research Scholar,Pachaiyappa’s College Chennai, India – 600 030.
  • P. Venkatesh Associate professor, Pachaiyappa’s College, Chennai, India – 600 030
  • P. BalaRamesh Associate professor, RMK Engineering College, Chennai, India– 601 206


azole stabilizers, dimethylamineborane, glycerol, nano thin film, surface roughness


In this study the effects of azole stabilizers, viz., benzotriazole (BTA) and 2-Mercaptobenzothiazole (2-MBT) on electroless deposition of copper nano thin film from glycerol containing eco-friendly copper methanesulphonate bath were studied. Dimethylamineborane (DMAB) was used as reducing agent and potassium hydroxide (KOH) was used as pH adjustor. The electroless bath was optimized by addition of 1 ppm concentration of stabilizers at 13.0. Surface morphology and structural property of copper deposits were studied by atomic force microscopy (AFM) and x-ray diffraction (XRD) method. Electrochemical and corrosion kinetic properties were analyzed by cyclic voltammetry (CV).2-Mercaptobenzothiazole was found to inhibit copper deposition while benzotriazole accelerated it. The crystallite size and surface roughness values were found to nano thin film deposition. Benzotriazole resulted in better physical and electrochemical properties of copper deposits than glycerol plain bath and 2-Mercaptobenzothiazole.


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How to Cite

S.Jayalakshmi, P. Venkatesh, & P. BalaRamesh. (2016). INFLUENCE OF AZOLE STABILIZERS ON AN ECOFRIENDLY ELECTROLESS COPPER NANO THIN FILM DEPOSITION. International Education and Research Journal (IERJ), 2(11). Retrieved from